An investigation of ultra low-k dielectrics with high thermal stability for integration in memory devices

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An investigation of ultra low-k dielectrics with high thermal stability for integration in memory devices
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  See discussions, stats, and author profiles for this publication at: https://www.researchgate.net/publication/257016364 An investigation of ultra low-k dielectrics withhigh thermal stability for integration inmemory devices  Article   in  Microelectronic Engineering · November 2007 DOI: 10.1016/j.mee.2007.05.040 CITATIONS 2 READS 55 7 authors , including:Mikhail R BaklanovIMEC International 378   PUBLICATIONS   5,052   CITATIONS   SEE PROFILE Laureen CarbonellRobert Bosch GmbH, Reutlingen, Germany 70   PUBLICATIONS   636   CITATIONS   SEE PROFILE Marleen Emma Van HoveIMEC International 229   PUBLICATIONS   1,903   CITATIONS   SEE PROFILE Herman MeynenDow Corning Corporation 23   PUBLICATIONS   167   CITATIONS   SEE PROFILE All content following this page was uploaded by Marleen Emma Van Hove on 04 February 2014. The user has requested enhancement of the downloaded file.
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